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China Material Technology Co., Ltd  

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China Material Technology Co., Ltd [China (Mainland)]


Business Type:Manufacturer
City: Nanchang
Province/State: Jiangxi
Country/Region: China (Mainland)

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  • High Purity Sputtering Target --- WS2 Target

High Purity Sputtering Target --- WS2 Target new

WS2

Sputtering Target
WS2 Target
Purity:99.9%

2014-05-14

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  • High Purity Sputtering Target --- WB2 target

High Purity Sputtering Target --- WB2 target new

WB2

sputtering target
WB2 target
purity:99.9%

2014-05-14

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  • High Purity Sputtering Target ---- Ti Target

High Purity Sputtering Target ---- Ti Target new

Ti

sputtering target
Ti target
purity:99.99%

2014-05-14

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  • High Purity Sputtering target --- Sm target

High Purity Sputtering target --- Sm target new

Sm

sputtering target
Sm target
purity:99.5%

2014-05-14

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  • High Purity Sputtering target ---- Pb target

High Purity Sputtering target ---- Pb target new

Pb

sputtering target
Pb target
purity:99.995%

2014-05-14

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  • High Purity Sputtering target --- NiO+Li target

High Purity Sputtering target --- NiO+Li target new

NiO+Li

sputtering target
NiO+Li
Purity:99.9%

2014-05-14

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  • High Purity Sputtering Target ---- ITO target

High Purity Sputtering Target ---- ITO target new

ITO

sputtering target
ITO target
Purity:99.99%

2014-05-14

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  • High Purity Sputtering Target ---- CrMn target

High Purity Sputtering Target ---- CrMn target new

CrMn

sputtering target
CrMn target
purity:99.9%

2014-05-14

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  • High Purity Sputtering target ---- CdTe target

High Purity Sputtering target ---- CdTe target new

CdTe

sputtering target
CdTe target
Purity:99.99%

2014-05-14

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  • High Purity Sputtering Target ---- AZO Target

High Purity Sputtering Target ---- AZO Target

AZO

Sputtering Target
AZO Target
Purity:99.95%

2014-05-14

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  • High Purity Sputtering target

High Purity Sputtering target new

PbSn

PbSn target
sputtering Target
Purity:99.9%

2014-05-14

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  • High Purity Sputtering Target ----- Ge target

High Purity Sputtering Target ----- Ge target new

Ge

sputtering target
Ge target
Purity:99.999%

2014-05-14

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  • High Purity Sputtering Target ---- NiO target

High Purity Sputtering Target ---- NiO target new

sputtering target
NiO target
Purity:99.9%

2014-05-14

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  • High Purity Sputtering Target ---- Al2O3 target

High Purity Sputtering Target ---- Al2O3 target new

sputtering target
Al2O3 target
Purity:99.99%

2014-05-14

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  • High Purity Sputtering Target----Carbon Target

High Purity Sputtering Target----Carbon Target new

Carbon

Sputtering Target
Carbon Target

2014-05-12

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  • High Purity Metal target ---Cu target

High Purity Metal target ---Cu target new

Cu

sputtering target

2014-05-05

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