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China Material Technology Co., Ltd  

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China Material Technology Co., Ltd [China (Mainland)]


Business Type:Manufacturer
City: Nanchang
Province/State: Jiangxi
Country/Region: China (Mainland)

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  • High purity sputtering target --- 99.999% purity of square silicon target

High purity sputtering target --- 99.999% purity of square silicon target new

material name:Silicon
purity:99.999%
Size:support any size
shape:circular,square
surface:single polishing ...

2014-08-12

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  • High purity sputtering target for PVD coating ---- Silicon target

High purity sputtering target for PVD coating ---- Silicon target new

material name:Silicon
purity:99.999%
Size:support any size
shape:circular,square
application:PVD coating

2014-08-12

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  • high purity sputtering target ---- V target

high purity sputtering target ---- V target new

V

sputtering target
V target
purity:99.9%

2014-05-15

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  • high purity sputtering target ---- Ru target

high purity sputtering target ---- Ru target new

sputtering target
material name:Ru target
purity:99.5%
shape:circular or square plate
size:diameter 1-2inches...

2014-08-14

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  • high purity sputtering target ----- CrB target

high purity sputtering target ----- CrB target new

CrB

sputteing target
CrB target
purity:99.9%

2014-05-15

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  • High Purity sputtering target ---- NiFe target

High Purity sputtering target ---- NiFe target new

NiFe

sputtering target
NiFe target
purity:99.9%

2014-05-15

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  • High Purity Sputtering target ---- Ta2O5 target

High Purity Sputtering target ---- Ta2O5 target new

Ta2O5 target

sputtering target
Ta2O5 target
purity:99.9%

2014-05-15

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  • high purity Sputteing target --- Co target

high purity Sputteing target --- Co target new

Co

sputtering target
Co target
purity:99.99%

2014-05-15

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  • High Purity Sputtering Target --- Sb pieces

High Purity Sputtering Target --- Sb pieces new

Sb

Sputtering Target
Sb Pieces
purity:99.5%

2014-05-15

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  • Sputtering Target Sputtering Target ---- Mg target

Sputtering Target Sputtering Target ---- Mg target

Mg

sputtering target
Mg target
purity:99.99%

2014-05-15

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  • High Purity Sputtering Target --- Ge Target

High Purity Sputtering Target --- Ge Target new

Ge

Sputtering Target
Ge Target
Purity:99.999%

2014-05-15

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  • High Purity Sputtering Target ---- ZrCu target

High Purity Sputtering Target ---- ZrCu target new

ZrCu

sputtering target
ZrCu target
purity:99.2%

2014-05-15

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  • High Purity Sputteing Target --- ZrAlNiCu target

High Purity Sputteing Target --- ZrAlNiCu target

ZrAlNiCu

sputtering target
ZrAlNiCu
purity:99.5%

2014-05-15

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  • High Purity Sputtering Target ---

High Purity Sputtering Target --- new

ZnO+Se

sputtering target
ZnO+Se
purity:99.99%

2014-05-15

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  • High Purity Sputtering Target ---- ZnO target

High Purity Sputtering Target ---- ZnO target new

ZnO

sputtering target
ZnO target
purity:99.99%

2014-05-15

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  • High Purity Sputtering Target ---- Zn target

High Purity Sputtering Target ---- Zn target

Zn

sputtering target
Zn target
purity:99.99%

2014-05-15

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