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China Material Technology Co., Ltd  

Gold Index: 10088

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Company Info

China Material Technology Co., Ltd [China (Mainland)]


Business Type:Manufacturer
City: Nanchang
Province/State: Jiangxi
Country/Region: China (Mainland)

Anna deng:   skype

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  • PalladiumTarget Metal target SputteringTarget for Coating and Evaporation

PalladiumTarget Metal target SputteringTarget for Coating and Evaporation

Pd

Model No.:Pd
Packing:vacuum neutral packi...
Surface Treatment:Coated
Brand Name:mat-cn
Thickness:more than 1mm...

2015-01-07

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  • Chromium for Manufacture of electronic devices spectrophotometer automatic control

Chromium for Manufacture of electronic devices spectrophotometer automatic control

Chromium-t

Chromium for Manufacture of electronic devices, spectrophotometer, automatic control,

2015-01-06

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  • High purity sputtering target Cobalt target ---- Co target

High purity sputtering target Cobalt target ---- Co target new

Brand Name Mat-cn
Model Number Co-T
is_customized Yes
Density Hi-density
Error Min-error ...

2014-08-14

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  • high purity sputtering target ---- Ru target

high purity sputtering target ---- Ru target new

sputtering target
material name:Ru target
purity:99.5%
shape:circular or square plate
size:diameter 1-2inches...

2014-08-14

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  • High purity and high density sputtering target ---- ITO target

High purity and high density sputtering target ---- ITO target new

material name:ITO
purity:99.99%
size:dia1-2inches
shape:ciecular or square plate
Application:PVD coating

2014-08-14

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  • High purity spttering target --- Ta foil

High purity spttering target --- Ta foil

material name:Ta
purity:99.99%
size:0.5mm thickness
shape:'circular or square
place of origin:JiangXi,China

2014-08-14

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  • High purity Sputtering target ---- TiAl target

High purity Sputtering target ---- TiAl target

material name:TiAl
purity:99.99%
size:diameter 1-2 inches ,3-5mm thickness
shape:circular
place of origin:JiangXi,China

2014-08-14

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  • High Purity sputtering target Y3Fe5O12 Target

High Purity sputtering target Y3Fe5O12 Target new

Y3Fe5O12

Brand Name Mat-cn
Model Number Y3Fe5O12-T
is_customized Yes
Density Hi-density
Error Min-error ...

2014-04-24

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  • High Purity Sputtering Target ---- ITO target

High Purity Sputtering Target ---- ITO target new

ITO

sputtering target
ITO target
Purity:99.99%

2014-05-14

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  • ATO Target sputtering target

ATO Target sputtering target new

ATO

Brand Name Mat-cn
Model Number ATO-T
is_customized Yes
Density Hi-density
Error Min-error ...

2014-04-23

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  • Ru Target sputtering Target

Ru Target sputtering Target new

Ru

Brand Name Mat-cn
Model Number Ru-T
is_customized Yes
Density Hi-density
Error Min-error ...

2014-04-23

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  • High purity Metal Target ---

High purity Metal Target --- new

SiC

sputtering target

2014-05-05

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  • High Purity Sputtering Target ---- Al2O3 target

High Purity Sputtering Target ---- Al2O3 target new

sputtering target
Al2O3 target
Purity:99.99%

2014-05-14

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  • High purity sputtering target ---- LiF target

High purity sputtering target ---- LiF target new

Material name:LiF
purity:99.99%
Size:support any size
shape:circular
Application:PVD coating ...

2014-08-12

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  • High purity and high density diameter 1-2 inches 5mm thickness puttering target ----- AlMg B14 target

High purity and high density diameter 1-2 inches 5mm thickness puttering target ----- AlMg B14 target new

material name:AlMgB14
purity :99.9%
size:1-3 inches(ordinary) supply any size
shape:circular plate
place of origin:JiangXi,China

2014-08-14

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  • High purity Sputtering target ---- CuInSe2 target

High purity Sputtering target ---- CuInSe2 target

material name:CuInSe2
purity:99.99%
size:dia2 inches ,3mm thickness
shape:circular
place of origin:JiangXi,China

2014-08-14

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